Equipment Library · 资料更新 2026-08-31Equipment Library · Updated 2026-08-31

五款桌面设备,按样品尺寸和工艺动作选。Five benchtop tools, routed by sample size and process step.

4 英寸与 6 英寸匀胶、6 英寸喷淋显影,以及两档加热面积。页面参数来自供应方正式规格书;微纳Hub负责把需求整理成可确认的设备配置。4-inch and 6-inch coating, 6-inch spray developing, and two hot-plate sizes. Specifications are traced to formal supplier sheets; MN Fab Hub helps turn requirements into a confirmable configuration.

5款正式型号documented models
4” / 6”匀胶尺寸梯度coating sizes
3路显影/冲洗/吹干develop/rinse/dry paths
120 / 160 mm加热区两档heating areas

Model SelectionModel Selection

先锁定尺寸,再看精度、化学体系与选配。Lock the size first, then review control, chemistry and options.

实物图来自本次供应方规格书。最高转速均按相应规格书的空载条件表述。Product images are taken from the supplied specification sheets. Maximum speeds are stated under the listed no-load conditions.

SMD-DT150 桌面式半自动6英寸显影机
喷淋显影 · 最大 6 英寸Spray developer · up to 6 inch

SMD-DT150

桌面式半自动 6 英寸显影机Benchtop semi-automatic 6-inch developer

把显影液喷淋、纯水冲洗和氮气吹干放进同一套可编程流程,CUP 可拆卸清洗,适合研发小批量与多工艺迭代。Combines developer spray, DI rinse and nitrogen drying in a programmable flow with a removable CUP for R&D batches.

基片Substrate
6 英寸及以内Up to 6 inch
主轴Spindle
12000 rpm 空载no-load
喷淋Spray
显影液 / 纯水 / 氮气Developer / DI / N₂
程序Recipes
10 × 10 steps

可按项目确认:背洗、多通道药液、异形载物盘、厂务纯水、加强排风和废液方案。Project options: backside rinse, extra chemical lines, custom holders, facility DI, exhaust and waste handling.

SMC-SPIN100ii 4英寸小型匀胶机
紧凑匀胶 · 最大 4 英寸Compact coater · up to 4 inch

SMC-SPIN100ii

4 英寸小型匀胶机4-inch compact spin coater

适合手套箱、通风橱和有限台面空间;腔体可取下清洗,并配随弃式内衬。Designed for gloveboxes, fume hoods and limited benches, with a removable bowl and disposable liner.

转速Speed
12000 rpm
程序Recipes
100 × 100 steps
尺寸Footprint
200 × 260 × 220 mm

自动滴胶与 4 英寸直接对中卡盘需按配置确认。Automatic dispensing and a 4-inch centering chuck require configuration confirmation.

SMC-SPIN150ii 6英寸高精密匀胶机
闭环匀胶 · 碎片至 6 英寸Closed-loop coater · fragments to 6 inch

SMC-SPIN150ii

6 英寸高精密匀胶机6-inch precision spin coater

闭环 PID 转速控制覆盖 10 mm 碎片至 6 英寸晶圆,适合更重视稳定性和后续自动化扩展的研发场景。Closed-loop PID speed control covers 10 mm fragments through 6-inch wafers for higher-stability R&D and future automation.

转速Speed
100-12000 rpm 空载no-load
加速度Acceleration
100-30000 rpm/s
程序Recipes
100 × 100 steps

可选自动滴胶、原位角;废液直排/随弃式内衬与上盖形式二选一。Optional dispensing and in-situ angle; waste and lid configurations are selected per project.

PvH-mini4 迷你加热台
精密加热 · 120 mm 区域Precision heating · 120 mm area

PvH-mini4

迷你加热台Compact hot plate

加热区Heating area
120 × 120 mm
恒温区Uniform area
100 × 100 mm
温区Range
室温-300 ℃Ambient-300 ℃

30 段程序;400 ℃扩展和观察视窗需确认。30 program segments; 400 ℃ extension and viewing window require confirmation.

PvH-mini6 高精密加热台
精密加热 · 160 mm 区域Precision heating · 160 mm area

PvH-mini6

高精密加热台Precision hot plate

加热区Heating area
160 × 160 mm
恒温区Uniform area
150 × 150 mm
温区Range
室温-300 ℃Ambient-300 ℃

30 段程序;更大尺寸定制、400 ℃扩展和观察视窗需确认。30 program segments; larger custom sizes, 400 ℃ extension and viewing window require confirmation.

Quick CompareQuick Compare

不要先问“哪台最好”,先问“哪台对得上”。Do not ask which is best; ask which one fits.

型号Model对象Target主参数Key range先确认Confirm first
SMD-DT1506 英寸及以内显影Develop up to 6 inch三路喷淋,10 × 10 步3 spray paths, 10 × 10 steps药液、排风、废液、气源Chemistry, exhaust, waste, gas
SMC-SPIN100ii4 英寸以内匀胶Coat up to 4 inch12000 rpm, 100 × 100卡盘、真空、滴胶Chuck, vacuum, dispense
SMC-SPIN150ii碎片至 6 英寸匀胶Fragment to 6 inch coating100-12000 rpm, PID废液、上盖、自动化Waste, lid, automation
PvH-mini4小尺寸加热/烘胶Compact bake/heating120 × 120 mm, 300 ℃样品面积、气流、程序Area, airflow, program
PvH-mini6更大面积加热/烘胶Larger-area bake/heating160 × 160 mm, 300 ℃样品面积、气流、功率Area, airflow, power

询价前准备Before Enquiry

六项信息,足够开始判断。Six inputs are enough to start.

合作边界Scope

参数有出处,承诺有条件。Traceable specifications, conditional commitments.

本页为合作设备的选型与采购资源对接,不代表微纳Hub自研自产。价格、交期、安装、培训、质保和验收以供应方确认、技术协议及合同为准;选配和定制项需要单独核价。This page supports selection and sourcing of partner equipment; it does not claim in-house manufacturing. Pricing, lead time, installation, training, warranty and acceptance remain subject to formal confirmation and contract.