电子束直写Electron-beam writing
聚焦电子束将数字图形写入电子敏感胶。A focused electron beam writes digital patterns into electron-sensitive resist.
在首页观看原理演示Watch the interactive study ↗电子束直写Electron-beam writing
聚焦电子束将数字图形写入电子敏感胶。Electron-beam writing
关键区别Key distinction
电子束曝光不是电子束蒸发，也不是直接刻蚀；散射会影响邻近区域。Exposure differs from electron-beam evaporation and etching. Scattering can affect adjacent features.
项目输入Project inputs
胶体系、剂量、邻近效应修正、拼接与充电Resist, dose, proximity correction, field stitching and charging.
整理项目需求Prepare a project brief ↗
进一步阅读Further reading
动画为非等比例原理示意，粒子、颜色、光路及材料厚度为解释性表达，不是测量结果或设备参数。Animation is not to scale. Particles, colors, optical paths and thicknesses are explanatory, not measurement results or tool parameters.