数字版图A digital pattern
不放置实体光掩模，写入来自数字图形。A digital pattern replaces a physical photomask.
激光直写Laser direct writing
依照数字版图，用光学束斑或调制光场直接曝光感光材料。A focused or spatially modulated optical field exposes photosensitive material from digital pattern data.
在首页观看原理演示Watch the interactive study ↗激光直写Laser direct writing
依照数字版图，用光学束斑或调制光场直接曝光感光材料。Laser direct writing
关键区别Key distinction
无掩模曝光不等于激光烧蚀；本示意没有移除基底材料。Maskless exposure is not laser ablation; this study does not remove substrate material.
观察路径What to observe
聚焦光学写入Focused optical writing
光束扫过胶层，轨迹不是烧蚀沟槽。Light scans the resist without ablating a trench.
潜像与显影Latent image and development
胶内曝光差异，随后由显影显现。Development reveals differences stored in the resist.
保留胶图形A resist pattern remains
此处演示光学直写，不代表双光子体积打印。This optical writing example is not volumetric two-photon printing.
项目输入Project inputs
光刻胶、图形尺寸、写入面积、灰度与拼接Resist, feature size, writing area, grayscale and stitching.
整理项目需求Prepare a project brief ↗
进一步阅读Further reading
动画为非等比例原理示意，粒子、颜色、光路及材料厚度为解释性表达，不是测量结果或设备参数。Animation is not to scale. Particles, colors, optical paths and thicknesses are explanatory, not measurement results or tool parameters.